Services
Plassys UHV evaporation system installed in the Binnig and Rohrer Nanotechnology Center (BRNC) cleanroom facility located at IBM Zürich laboratories in Rüschlikon.
The QE Center provides the following services:
- DSP Block Implementation
- System Controller Implementation
- Peripheral Interface Implementation
- Verification
For more information, please contact Abdulkadir Akin
- UHV magnetron sputtering deposition of Nb, NbTi, NbN, TiN, NbTiN.
- UHV evaporation of Al.
- HV evaporation of metals (Ti, Cr, Au, Al, Mo) and oxides (SiO2, Al2O3)
- ALD and PE-ALD deposition of Al2O3, TiN
Available substrates: 4 inch intrinsic Si, 2inch epi-ready Sa; custom holders compatible with custom small substrates. High Quality factors for Nb or Al microwave resonators> Q >1M on Si @4-6GHz. Resistivity, Tc, Hc and RRR characterization. Process development for tailored properties, eg high kinetic induction NbTiN ultra-thin films (5-15nm).
For more information, please contact Mihai Gabureac
- UV/DUV projection Photolithography.
- Direct laser writing photolithography.
- Quartz and Sodalime 3inch/4inch/5inch photolithography mask fabrication
- RIE/ICP selective etch of Nb, NbTiN (Ar/SF6/O2) and Al (BCL3/Cl2) with End Point Detection.
- Wet etch of Nb, NbTiN, Al, Mo, Cr.
- Piranha, HF and NMP cleaning.
- 3D AirBridges by lift-off.
- EBL (30kV and 100kV) e-beam lithography.
- Process optimization and custom process development.
For more information, please contact Mihai Gabureac